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Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

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Muglali,  Mutlu Iskender
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Bashir,  Asif
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Rohwerder,  Michael
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Muglali, M. I., Bashir, A., Birkner, A., & Rohwerder, M. (2012). Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers. Journal of Materials Chemistry, 22(29), 14337-14340. doi:10.1039/c2jm32111d.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-2DF9-0
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