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In-situ backside surface enhanced Raman study on the reactive wetting process at noble metal-monolayer interfaces supported by SKP, XPS and ToF-SIMS

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Santa,  M.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Posner,  R.
Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Grundmeier,  G.
Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Santa, M., Posner, R., & Grundmeier, G. (2009). In-situ backside surface enhanced Raman study on the reactive wetting process at noble metal-monolayer interfaces supported by SKP, XPS and ToF-SIMS. Talk presented at Kurt Schwabe Symposium 2009. Erlangen, Germany. 2009-05-24 - 2009-05-28.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-4118-0
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