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Residual stress analysis in chemical-vapor-deposition diamond films

MPS-Authors
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Liu,  T.
Microscopy and Diffraction, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Pinto,  H.
Materials Testing, Material Diagnostics and Steel Technology, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Raabe,  D.
Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Liu, T., Pinto, H., Brito, P., Sales, L. A., & Raabe, D. (2009). Residual stress analysis in chemical-vapor-deposition diamond films. Applied Physics Letters, 94(20): 201902 (3pp). doi:10.1063/1.3139083.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-4121-9
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