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Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si

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Borodin,  S.
Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Hassel,  A. W.
Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Mozalev, A., Smith, A. J., Borodin, S., Plihauka, A., Hassel, A. W., Sakairi, M., et al. (2009). Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si. Electrochim. Acta, 54, 935-945. doi:10.1016/j.electacta.2008.08.030.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-42FA-C
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