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FEM Simulation of the Scanning Electrochemical Potential Microscopy (SECPM)

MPS-Authors
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Hamou,  R. F.
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Biedermann,  P. U.
Atomistic Modelling in Interface Science, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Rohwerder,  M.
Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Blumenau,  A. T.
Atomistic Modelling in Interface Science, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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引用

Hamou, R. F., Biedermann, P. U., Rohwerder, M., & Blumenau, A. T. (2008). FEM Simulation of the Scanning Electrochemical Potential Microscopy (SECPM). Talk presented at Comsol European Conference 2008. Hannover, Germany. 2008-11-04 - 2008-11-06.


引用: http://hdl.handle.net/11858/00-001M-0000-0019-4571-4
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