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Intensity Modulated Photo Electrochemistry of Laser Irradiated Semiconductors

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Fenster,  J. C.
Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Rohwerder,  M.
Christian Doppler Laboratory for Diffusion and Segregation Mechanisms, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125170

Hassel,  A. W.
Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Fenster, J. C., Rohwerder, M., & Hassel, A. W. (2006). Intensity Modulated Photo Electrochemistry of Laser Irradiated Semiconductors. Poster presented at 6th International Symposium on Electrochemical Micro & Nanosystem Technologies, Bonn, Germany.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-584E-3
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