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Temperature stability of thin anodic oxide films in metal/insulator/metal structures: A comparison between tantalum and aluminium oxide

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Hassel,  A. W.
Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Jeliazova, Y., Kayser, M., Mildner, B., Hassel, A. W., & Diesing, D. (2006). Temperature stability of thin anodic oxide films in metal/insulator/metal structures: A comparison between tantalum and aluminium oxide. Thin Solid Films, 500, 330-335.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-5B5C-9
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