Morphology and patterning processes of thin organosilicon and perfluorinated 
bi-layer plasma polymer films

Wang, X.; Grundmeier, G.

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Morphology and patterning processes of thin organosilicon and perfluorinated bi-layer plasma polymer films

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Wang, X.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Grundmeier, G.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Wang, X., & Grundmeier, G. (2006). Morphology and patterning processes of thin organosilicon and perfluorinated bi-layer plasma polymer films. Plasma Processes and Polymers, 3(1), 39-47.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0019-5B6C-5

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