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Chemical structure and morphology of thin bilayer and composite organosilicon and fluorocarbon microwave plasma polymer films

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Grundmeier,  G.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Christian Doppler Laboratory for Metal/Polymer Interfaces, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Carpentier, J., & Grundmeier, G. (2005). Chemical structure and morphology of thin bilayer and composite organosilicon and fluorocarbon microwave plasma polymer films. Surface and Coatings Technology, 192(2-3), 189-198.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-611F-F
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