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The effect of Oxygen Reduction on the Self-Assembly and Stability of Thiol Monolayer Films

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Rohwerder,  Michael
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Stratmann,  Martin
Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Rohwerder, M., & Stratmann, M. (2004). The effect of Oxygen Reduction on the Self-Assembly and Stability of Thiol Monolayer Films. Talk presented at 205th Meeting of the ECS. San Antonio, TX, USA. 2004-05-09 - 2004-05-14.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-653F-D
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