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Formation of mesoscopic structures by the CVD of SiH4 on Fe(100)

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Rohwerder,  Michael
Institut für Werkstoffwissenschaften IV, Universität Erlangen, 91058 Erlangen, Germany;
Molecular Structure and Surface Modification, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125406

Stratmann,  Martin
Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Institut für Werkstoffwissenschaften IV, Universität Erlangen, Erlangen, D-91058, Germany;

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Citation

Rebhan, M. E., Rohwerder, M., & Stratmann, M. (2002). Formation of mesoscopic structures by the CVD of SiH4 on Fe(100). Chemical Vapor Deposition, 8(6), 259-261. doi:10.1002/1521-3862(20021203)8:6<259:AID-CVDE259>3.0.CO;2-8.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-6D66-F
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