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Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters

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Shirtcliffe,  N.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Thiemann,  P.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Stratmann,  M.
Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Grundmeier,  G.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Shirtcliffe, N., Thiemann, P., Stratmann, M., & Grundmeier, G. (2001). Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters. Surface & Coatings Technology, 142-144, 1121-1128.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0019-70C0-0
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