Chemical structure and morphology of thin, organo-silicon plasma-polymer films 
as a function of process parameters

Shirtcliffe, N.; Thiemann, P.; Stratmann, M.; Grundmeier, G.

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Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters

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Shirtcliffe, N.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Thiemann, P.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Stratmann, M.
Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Grundmeier, G.
Adhesion and Thin Films, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Shirtcliffe, N., Thiemann, P., Stratmann, M., & Grundmeier, G. (2001). Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parameters. Surface & Coatings Technology, 142-144, 1121-1128.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0019-70C0-0

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