Ion Sputter Rates and Yields for Iron-, Chromium- and Aluminium Oxide Layers

Viefhaus, Helmut; Hennesen, Klaus; Lucas, Manfred; Müller-Lorenz, Else Marie; Grabke, Hans-Jürgen

doi:10.1002/sia.740210911

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Ion Sputter Rates and Yields for Iron-, Chromium- and Aluminium Oxide Layers

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Viefhaus, Helmut
Physical Chemistry, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125175

Hennesen, Klaus
Physical Chemistry, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125259

Lucas, Manfred
Physical Chemistry, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125288

Müller-Lorenz, Else Marie
Physical Chemistry, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125157

Grabke, Hans-Jürgen
Physical Chemistry, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Viefhaus, H., Hennesen, K., Lucas, M., Müller-Lorenz, E. M., & Grabke, H.-J. (1994). Ion Sputter Rates and Yields for Iron-, Chromium- and Aluminium Oxide Layers. Surface and Interface Analysis, 21(9), 665-672. doi:10.1002/sia.740210911.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0019-744E-3

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