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EELS Measurements and Ab-initio Calculations of the N–K Edge in TiN/VN Films Deposited on MgO Substrates

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Rashkova, B., Zhang, Z., Šturm, S., Kothleitner, G., Kutschej, K., Mitterer, C., et al. (2009). EELS Measurements and Ab-initio Calculations of the N–K Edge in TiN/VN Films Deposited on MgO Substrates. In G. Kothleitner (Ed.), 9th Multinational Microscopy Conference 2009 (pp. 285-286). Graz, Austria: Verlag der Technischen Universität Graz.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0024-5556-F
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