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Image-Based in Situ Identification of Face Specific Crystal Growth Rates from Crystal Populations

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Borchert,  Christian
Process Systems Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;

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Temmel,  Erik
International Max Planck Research School (IMPRS), Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;
Physical and Chemical Foundations of Process Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;

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Lorenz,  Heike
Physical and Chemical Foundations of Process Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;

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Seidel-Morgenstern,  Andreas
Physical and Chemical Foundations of Process Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;
Otto-von-Guericke-Universität Magdeburg, External Organizations;

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Sundmacher,  Kai
Process Systems Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;
Otto-von-Guericke-Universität Magdeburg, External Organizations;

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Borchert, C., Temmel, E., Eisenschmidt, H., Lorenz, H., Seidel-Morgenstern, A., & Sundmacher, K. (2014). Image-Based in Situ Identification of Face Specific Crystal Growth Rates from Crystal Populations. Crystal Growth & Design, 14(3), 952-971. doi:10.1021/cg401098x.


Cite as: http://hdl.handle.net/11858/00-001M-0000-001A-1086-0
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