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Optimizing Photo Mask Layout for Grey‐tone Lithography

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Hopf,  Jörn
Programming Logics, MPI for Informatics, Max Planck Society;

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Hopf, J.(1996). Optimizing Photo Mask Layout for Grey‐tone Lithography (140). IBFI GmbH, Schloss Dagstuhl, D‐66687 Wadern, Germany: IBFI.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0023-C685-F
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