Investigation of thin dye films on fused silica by optical second harmonic 
generation

Werner, L.; Hill, W.; Marlow, Frank; Glismann, A.; Hertz, O.

doi:10.1016/0040-6090(91)90471-9

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Investigation of thin dye films on fused silica by optical second harmonic generation

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Marlow, Frank
Freie Universität Berlin, Institut für theoretische Physik, Arnimallee 14, W-1000 Berlin 33 F.R.G.;
Research Group Marlow, Max-Planck-Institut für Kohlenforschung, Max Planck Society;

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Citation

Werner, L., Hill, W., Marlow, F., Glismann, A., & Hertz, O. (1991). Investigation of thin dye films on fused silica by optical second harmonic generation. Thin Solid Films, 205(1), 58-63. doi:10.1016/0040-6090(91)90471-9.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0024-2219-E

Abstract

Second harmonic generation (SHG) in evaporated films of rhodamine 6G on fused silica is investigated in the internal reflection geometry. The dependence of SHG on the angle of incidence is strongly affected ny the thickness of the dye films which are in the range up to 15 nm. A macroscopic layer model including the linear optical properties of the dye film is used to interpret the angular dependences of SHG and to determine the location of the oriented molecules within the film.