Imposition of defined states of stress on thin films by a wafer-curvature 
method; validation and application to aging Sn films

Stein, Jendrik; Pascher, M.; Welzel, Udo; Huegel, W.; Mittemeijer, Eric-Jan

doi:10.1016/j.tsf.2014.08.007

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Imposition of defined states of stress on thin films by a wafer-curvature method; validation and application to aging Sn films

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Stein, Jendrik
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Robert Bosch GmbH;

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Welzel, Udo
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, Eric-Jan
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Materialwissenschaft, Universität Stuttgart;

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Stein, J., Pascher, M., Welzel, U., Huegel, W., & Mittemeijer, E.-J. (2014). Imposition of defined states of stress on thin films by a wafer-curvature method; validation and application to aging Sn films. Thin Solid Films, 568, 52-57. doi:10.1016/j.tsf.2014.08.007.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0024-AFEF-1

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