Element specific monolayer depth profiling

Macke, S.; Radi, A.; Hamann-Borrero, J. E.; Verna, A.; Bluschke, M.; Brück, S.; Goering, E.; Sutarto, R.; He, F.; Cristiani, G.; Wu, M.; Benckiser, E.; Habermeier, H.-U.; Logvenov, G.; Gauquelin, N.; Botton, G. A.; Kajdos, A. P.; Stemmer, S.; Sawatzky, G. A.; Haverkort, M. W.; Keimer, B.; Hinkov, V.

doi:10.1002/adma.201402028

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Element specific monolayer depth profiling

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Goering, E.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Macke, S., Radi, A., Hamann-Borrero, J. E., Verna, A., Bluschke, M., Brück, S., et al. (2014). Element specific monolayer depth profiling. Advanced Materials, 26(38), 6554-6559. doi:10.1002/adma.201402028.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0024-C51A-D

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