Polarization-dependent photothermal beam deflection for the determination of 
the order parameter C-2 in a laser-oriented polymer system

Einsiedel, H.; Mittler-Neher, Silvia

doi:10.1364/AO.35.005406

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Polarization-dependent photothermal beam deflection for the determination of the order parameter C-2 in a laser-oriented polymer system

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Einsiedel, H.
MPI for Polymer Research, Max Planck Society;

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Mittler-Neher, Silvia
MPI for Polymer Research, Max Planck Society;

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Einsiedel, H., & Mittler-Neher, S. (1996). Polarization-dependent photothermal beam deflection for the determination of the order parameter C-2 in a laser-oriented polymer system. Applied Optics, 35(27), 5406-5411. doi:10.1364/AO.35.005406.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0024-B4C4-3

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