Microcontact-printing-assisted access of graphitic carbon nitride films with 
favorable textures toward photoelectrochemical application

Liu, Jian; Wang, Hongqiang; Chen, Zupeng; Möhwald, Helmuth; Fiechter, Sebastian; van de Krol, Roel; Wen, Liping; Jiang, Lei; Antonietti, Markus

doi:10.1002/adma.201404543

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Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

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Liu, Jian
Markus Antonietti, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Wang, Hongqiang
Helmuth Möhwald, Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

/persons/resource/persons133768

Chen, Zupeng
Dariya Dontsova, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Möhwald, Helmuth
Helmuth Möhwald, Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Antonietti, Markus
Markus Antonietti, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Citation

Liu, J., Wang, H., Chen, Z., Möhwald, H., Fiechter, S., van de Krol, R., et al. (2015). Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application. Advanced Materials, 27(4), 712-718. doi:10.1002/adma.201404543.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0025-06C9-5

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