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In situ investigation of the interlayer dominated failure of Cu thin films for flexible electronic devices

MPS-Authors
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Marx,  Vera Maria
Advanced Transmission Electron Microscopy, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125219

Kirchlechner,  Christoph
Nano-/ Micromechanics of Materials, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons75388

Dehm,  Gerhard
Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Marx, V. M., Toth, F., Wiesinger, A., Berger, J., Kirchlechner, C., Cordill, M. J., et al. (2014). In situ investigation of the interlayer dominated failure of Cu thin films for flexible electronic devices. Poster presented at Gordon Research Conference “Thin Film and Small Scale Mechanical Behavior”, Bentley University, Waltham, Waltham, MA, USA.


Cite as: https://hdl.handle.net/11858/00-001M-0000-001A-0946-2
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