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Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth

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Hopf,  C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob,  W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf, C., Jacob, W., & von Keudell, A. (2005). Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth. Journal of Applied Physics, 97: 094904. doi:10.1063/1.1883729.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-1471-5
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