Ion-induced surface activation, chemical sputtering, and hydrogen release 
during plasma-assisted hydrocarbon film growth

Hopf, C.; Jacob, W.; von Keudell, A.

doi:10.1063/1.1883729

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Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth

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Hopf, C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf, C., Jacob, W., & von Keudell, A. (2005). Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth. Journal of Applied Physics, 97: 094904. doi:10.1063/1.1883729.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-1471-5

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