Control of the plasma chemistry of a pulsed inductively coupled methane plasma

Bauer, M.; Schwarz-Selinger, T.; Kang, H.; von Keudell, A.

doi:10.1088/0963-0252/14/3/017

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Control of the plasma chemistry of a pulsed inductively coupled methane plasma

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Bauer, M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger, T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Kang, H.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Bauer, M., Schwarz-Selinger, T., Kang, H., & von Keudell, A. (2005). Control of the plasma chemistry of a pulsed inductively coupled methane plasma. Plasma Sources Science and Technology, 14, 543-548. doi:10.1088/0963-0252/14/3/017.

引用: https://hdl.handle.net/11858/00-001M-0000-0027-1801-1

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