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Journal Article

Bayesian group analysis of plasma-enhanced chemical vapour deposition data

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Fischer,  R.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Fischer, R. (2004). Bayesian group analysis of plasma-enhanced chemical vapour deposition data. New Journal of Physics, 6: 25. doi:10.1088/1367-2630/6/1/025.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-1B10-9
Abstract
A ubiquitous goal in plasma-enhanced chemical vapour deposition (PECVD) is to describe the correlation between film properties and categorical and quantitative input variables. The correlations within the high-dimensional parameter space are described using a multivariate model. Bayesian group analysis is employed to assess the grouping structures of the set of data vectors. This allows to identify sub-groups or meta-groups of predefined groups of data sets, e.g. with respect to source gases. Outliers can be identified by the necessity to form a separate group. The Bayesian approach consistently allows the handling of missing data. The grouping probabilities were compared with classical approaches such as likelihood ratio tests, the Akaike information criterion and a Bayesian variant called Bayesian information criterion. The method was applied to PECVD data of rare-earth oxide film deposition and hydrocarbon film deposition to study the evidence of grouping structures attributed to categorical quantities such as rare-earth components or source gases and quantitative variates such as bias voltage.