Elementary processes in plasma-surface interaction: H-atom and ion-induced 
chemisorption of methyl on hydrocarbon film surfaces

von Keudell, A.; Jacob, W.

doi:10.1016/j.progsurf.2004.001

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Elementary processes in plasma-surface interaction: H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces

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Jacob, W.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell, A., & Jacob, W. (2004). Elementary processes in plasma-surface interaction: H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces. Progress in Surface Science, 76, 21-54. doi:10.1016/j.progsurf.2004.001.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-1B17-C

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