English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system

MPS-Authors
/persons/resource/persons109819

Linsmeier,  C.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource
No external resources are shared
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Gao, L., Härter, P., Linsmeier, C., Gstöttner, J., Emling, R., & Schmitt-Landsiedel, D. (2004). Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system. Materials Science in Semiconductor Processing, 7, 331-335. Retrieved from http://dx.doi.org/10.1016/j.mssp.2004.09.128.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-20E6-4
Abstract
There is no abstract available