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Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system

MPS-Authors
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Fischer,  R.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Gori,  S.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Knauer,  J.
W7-X: Project Coordination (PC), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Yoon, J.-S., Fischer, R., Gori, S., & Knauer, J. (2004). Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system. Journal of the Korean Physical Society, 6, 1544-1552.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-20E8-F
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