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Chemical sputtering of hydrocarbon films

MPS-Authors
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Hopf,  C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell,  A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109489

Jacob,  W.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Hopf, C., von Keudell, A., & Jacob, W. (2003). Chemical sputtering of hydrocarbon films. Journal of Applied Physics, 94(4), 2373-2380. doi:10.1063/1.1594273.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-3B61-E
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