Particle-beam experiment to study heterogeneous surface reactions relevant to 
plasma-assisted thin film growth and etching

Jacob, W.; Hopf, C.; von Keudell, A.; Meier, M.; Schwarz-Selinger, T.

doi:10.1063/1.1628845

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Particle-beam experiment to study heterogeneous surface reactions relevant to plasma-assisted thin film growth and etching

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Jacob, W.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf, C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell, A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Meier, M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110460

Schwarz-Selinger, T.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W., Hopf, C., von Keudell, A., Meier, M., & Schwarz-Selinger, T. (2003). Particle-beam experiment to study heterogeneous surface reactions relevant to plasma-assisted thin film growth and etching. Review of Scientific Instruments, 74(12), 5123-5136. doi:10.1063/1.1628845.

引用: https://hdl.handle.net/11858/00-001M-0000-0027-3DBE-E

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