English
 
User Manual Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Crystal structure characterisation of filtered arc deposited alumina coatings: temperature and bias voltage

MPS-Authors
/persons/resource/persons108791

Brill,  R.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109646

Koch,  F.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109912

Mazurelle,  J.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109795

Levchuk,  D.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons108606

Balden,  M.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

Maier,  H.
Max Planck Society;

/persons/resource/persons108745

Bolt,  H.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

Locator
There are no locators available
Fulltext (public)
There are no public fulltexts available
Supplementary Material (public)
There is no public supplementary material available
Citation

Brill, R., Koch, F., Mazurelle, J., Levchuk, D., Balden, M., Yamada-Takamura, Y., et al. (2003). Crystal structure characterisation of filtered arc deposited alumina coatings: temperature and bias voltage. Surface and Coatings Technology, 174-175, 606-610. doi:10.1016/S0257-8972(03)00539-5.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-3E02-C
Abstract
Using a filtered vacuum arc deposition device, stoichiometric aluminum oxide (Al₂O₃) films, with thickness ranging from 20 nm to several microns, were produced under various substrate bias voltages and temperatures. Analysis of the resulting alumina crystal structures was performed with transmission electron microscopy, Fourier transform infrared spectroscopy and X-ray diffraction. Depending on the negative substrate bias voltage, the deposition temperature required to form -Al₂O₃ could be reduced. A crystal phase diagram showing the effect of bias and temperature is presented. Also, preliminary hydrogen permeation measurements of these coatings deposited on thin palladium foil show a good barrier performance as compared with uncoated samples.