Local structure of OH adsorbed on the Ge(0 0 1)(2 × 1) surface using 
scanned-energy mode photoelectron diffraction

Koebbel, A.; Polcik, M.; Lloyd, D. R.; McGovern, I. T.; Schaff, O.; Lindsay, R.; Patchett, A. J.; Bradshaw, A. M.; Woodruff, D. P.

doi:10.1016/S0039-6028(03)00828-8

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Local structure of OH adsorbed on the Ge(0 0 1)(2 × 1) surface using scanned-energy mode photoelectron diffraction

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Bradshaw, A. M.
Office of the Director (DI), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Koebbel, A., Polcik, M., Lloyd, D. R., McGovern, I. T., Schaff, O., Lindsay, R., et al. (2003). Local structure of OH adsorbed on the Ge(0 0 1)(2 × 1) surface using scanned-energy mode photoelectron diffraction. Surface Science, 540, 246-254. doi:10.1016/S0039-6028(03)00828-8.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-3F2C-6

Abstract

The local geometry of OH fragments adsorbed on the Ge(0 0 1)(2 × 1) surface has been examined using O 1s scanned energy mode photoelectron diffraction. These fragments were obtained by the dissociative reaction of the clean surface with H₂O. The Ge–O bond length is found to be 1.76 ± 0.02 Å and the Ge–O bond angle to be 15° ± 2° relative to the surface normal. Some information about the positions of the Ge dimer atoms has also been obtained.