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Journal Article

Ion beam analysis of rough thin films


Mayer,  M.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Mayer, M. (2002). Ion beam analysis of rough thin films. Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms, 194(2), 177-186.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-40B8-E
The influence of surface roughness on Rutherford backscattering spectroscopy (RBS) spectra has been studied experimentally and by computer simulation with the SIMNRA code. Rough thin films are described by a distribution of film thicknesses, while rough substrates are approximated by a distribution of local inclination angles. Correlation effects of surface roughness are neglected. Rough film effects can be calculated for RBS including non-Rutherford scattering, nuclear reaction analysis and elastic recoil detection analysis. The results of simulation calculations show good agreement with experimental data. For thin films of high Z elements on rough substrates additionally plural scattering plays an important role. (C) 2002 Elsevier Science B.V. All rights reserved.