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Growth mechanism of amorphous hydrogenated carbon

MPS-Authors
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von Keudell,  A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Meier,  M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf,  C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

von Keudell, A., Meier, M., & Hopf, C. (2002). Growth mechanism of amorphous hydrogenated carbon. Diamond and Related Materials, 11, 969-975.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-4203-5
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