Hydrogen-induced chemical erosion of amorphous hydrogenated carbon thin films: 
Structure and reactivity

Zecho, T.; Brandner, B. D.; Biener, J.; Küppers, J.

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Hydrogen-induced chemical erosion of amorphous hydrogenated carbon thin films: Structure and reactivity

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Zecho, T.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Zecho, T., Brandner, B. D., Biener, J., & Küppers, J. (2002). Hydrogen-induced chemical erosion of amorphous hydrogenated carbon thin films: Structure and reactivity. Journal of Physical Chemistry B, 106(3), 610-616.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-42E6-5

Abstract

In the present study, we investigated the effects of annealing of amorphous hydrogenated carbon (a-C:H) films, particularly with respect to structural changes of the carbon network and their impact on the hydrogen-atom-induced erosion. The a-C:H films were deposited at 300 K on a Pt(111) single crystal using the ion-beam deposition (IBD) method. Electron energy loss spectroscopy (EELS) and high-resolution electron energy loss spectroscopy (HREELS) were employed to monitor structural changes of the carbon network as a function of the annealing temperature. A transition from an sp(3)-rich carbon network toward an sp(2) dominated, "graphitic" structure was observed around 900 K. The hydrogen-induced erosion of as-deposited and annealed a-C:H films was investigated by in situ mass spectrometry. The postdeposition annealing did not change the overall erosion rates of a-C:H films; however, the product distribution indicates the growth of existing graphitic structures as a consequence of annealing at temperatures above 900 K.