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Micron-scale modifications of Si surface morphology by pulsed-laser texturing

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Schwarz-Selinger,  T.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger, T., Cahill, D. G., Chen, S.-C., Moon, S.-J., & Grigoropoulos, C. P. (2001). Micron-scale modifications of Si surface morphology by pulsed-laser texturing. Physical Review B, 64: 155323. Retrieved from http://prola.aps.org/browse?journal=PRB.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-45E6-F
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