Growth of copper and vanadium on a thin Al2O3-film on Ni3Al(111)

Wiltner, A.; Rosenhahn, A.; Schneider, J.; Becker, C.; Pervan, P.; Milun, M.; Kralj, M.; Wandelt, K.

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Growth of copper and vanadium on a thin Al₂O₃-film on Ni₃Al(111)

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Wiltner, A.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Wiltner, A., Rosenhahn, A., Schneider, J., Becker, C., Pervan, P., Milun, M., et al. (2001). Growth of copper and vanadium on a thin Al₂O₃-film on Ni₃Al(111). Thin Solid Films, 400, 71-75. Retrieved from http://www.sciencedirect.com/science/journal/00406090.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-4931-9

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