ERRATUM: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on 
Silicon

Jacob, W.; von Keudell, A.; Schwarz-Selinger, T.

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ERRATUM: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon

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Jacob, W.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell, A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger, T.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W., von Keudell, A., & Schwarz-Selinger, T. (2001). ERRATUM: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon. Brazilian Journal of Physics, 31, 109.

引用: https://hdl.handle.net/11858/00-001M-0000-0027-51B7-7

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