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Conference Paper

Fundamental Growth Mechanisms during PECVD of Carbon Thin Films

MPS-Authors
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von Keudell,  A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Meier,  M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf,  C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

von Keudell, A., Meier, M., & Hopf, C. (2001). Fundamental Growth Mechanisms during PECVD of Carbon Thin Films.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-585C-3
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