English
 
User Manual Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse
  1. Item Summary

Item

ITEM ACTIONSEXPORT
Add to Basket
  Local TagsStatisticsRelease HistoryDetailsSummary

Released
Journal Article

Influence of deposition temperature and bias voltage on the crystalline phase of Er2O3 thin films deposited by filtered cathodic arc

MPS-Authors
/persons/resource/persons108545

Adelhelm,  C.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110151

Pickert,  T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109646

Koch,  F.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons108606

Balden,  M.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109493

Jahn,  S.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

Maier,  H.
Max Planck Society;

Locator
There are no locators available
Fulltext (public)
There are no public fulltexts available
Supplementary Material (public)
There is no public supplementary material available
Citation

Adelhelm, C., Pickert, T., Koch, F., Balden, M., Jahn, S., Rinke, M., et al. (2011). Influence of deposition temperature and bias voltage on the crystalline phase of Er2O3 thin films deposited by filtered cathodic arc. Journal of Nuclear Materials, 417(1-3), 798-801. doi:10.1016/j.jnucmat.2010.12.163.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0026-E899-1
Abstract
There is no abstract available