Carbide formation in tungsten-containing amorphous carbon films by annealing

Balden, M.; Sauter, P. A.; Jong, S.; Adelhelm, C.; Lindig, S.; Rasinski, M.; Plocinski, T.

doi:10.1016/j.tsf.2011.01.403

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Carbide formation in tungsten-containing amorphous carbon films by annealing

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Balden, M.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Sauter, P. A.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jong, S.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Adelhelm, C.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Lindig, S.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons130844

Rasinski, M.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Balden, M., Sauter, P. A., Jong, S., Adelhelm, C., Lindig, S., Rasinski, M., et al. (2011). Carbide formation in tungsten-containing amorphous carbon films by annealing. Thin Solid Films, 519(12), 4049-4053. doi:10.1016/j.tsf.2011.01.403.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0026-E93A-F

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