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Journal Article

Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions

MPS-Authors
/persons/resource/persons109489

Jacob,  W.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110460

Schwarz-Selinger,  T.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110652

von Toussaint,  U.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Harris, P. R., Meyer, F. W., Jacob, W., Schwarz-Selinger, T., & von Toussaint, U. (2011). Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 269(11), 1276-1279. doi:10.1016/j.nimb.2010.12.071.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0026-EA12-0
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