Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar+ 
ions and water vapor

Hopf, C.; Schlüter, M.; Jacob, W.

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Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar⁺ ions and water vapor

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Hopf, C.
ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf_Chemical.pdf
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引用

Hopf, C., Schlüter, M., & Jacob, W. (2008). Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar⁺ ions and water vapor. Journal of Physics: Conference Series, 100:. Retrieved from http://dx.doi.org./10.1088/1742-6596/100/6/062012.

引用: https://hdl.handle.net/11858/00-001M-0000-0026-FE30-7

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