Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic 
hydrogen

Schlüter, M.; Hopf, C.; Jacob, W.

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Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen

MPS-Authors

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Hopf, C.
ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schlüter_Chemical.pdf
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引用

Schlüter, M., Hopf, C., & Jacob, W. (2008). Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen. New Journal of Physics, 10:. Retrieved from http://dx.doi.org/10.1088/1367-2630/10/5/053037.

引用: https://hdl.handle.net/11858/00-001M-0000-0026-FE63-6

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