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Journal Article

Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen

MPS-Authors
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Hopf,  C.
ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger,  T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob,  W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schlüter_Temperature.pdf
(Any fulltext), 258KB

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Citation

Schlüter, M., Hopf, C., Schwarz-Selinger, T., & Jacob, W. (2008). Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen. Journal of Nuclear Materials, 376(1), 33-37. Retrieved from http://dx.doi.org/10.1016/j.jnucmat.2008.02.002.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0026-FF38-F
Abstract
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