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Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen

MPS-Authors
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Hopf,  C.
ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger,  T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Toussaint,  U.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob,  W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf_chemicalsputtering.pdf
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Citation

Hopf, C., Schlüter, M., Schwarz-Selinger, T., von Toussaint, U., & Jacob, W. (2008). Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen. New Journal of Physics, 10: 093022 (27pp). doi:10.1088/1367-2630/10/9/093022.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0027-0088-7
Abstract
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