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Journal Article

Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures

MPS-Authors
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Hopf,  C.
Experimental Plasma Physics 4 (E4), Max Planck Institute for Plasma Physics, Max Planck Society;
ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob,  W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf2.pdf
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Citation

Hopf, C., Schlüter, M., & Jacob, W. (2007). Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures. Applied Physics Letters, 90: 224106. Retrieved from http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=APPLAB000090000022224106000001&idtype=cvips&gifs=Yes.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-060C-9
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