Characterization of temperature-induced changes in amorphous hydrogenated 
carbon thin films

Hopf, C.; Angot, T.; Areou, E.; Dürbeck, T.; Jacob, W.; Martin, C.; Pardanaud, C.; Roubin, P.; Schwarz-Selinger, T.

doi:10.1016/j.diamond.2013.05.004

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Journal Article

Characterization of temperature-induced changes in amorphous hydrogenated carbon thin films

MPS-Authors

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Hopf, C.
ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons108981

Dürbeck, T.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109489

Jacob, W.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110460

Schwarz-Selinger, T.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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http://dx.doi.org/10.1016/j.diamond.2013.05.004
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Hopf_Characterization.pdf
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Citation

Hopf, C., Angot, T., Areou, E., Dürbeck, T., Jacob, W., Martin, C., et al. (2013). Characterization of temperature-induced changes in amorphous hydrogenated carbon thin films. Diamond and Related Materials, 37, 97-103. doi:10.1016/j.diamond.2013.05.004.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0026-DDAF-8

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