What makes a dangling bond a binding site for thermal CH3 radicals? — A 
combined molecular dynamics and potential energy analysis study on amorphous 
hydrocarbon films

Maya, P. N.; Toussaint, U. von; Jacob, W.

doi:10.1016/j.diamond.2013.09.005

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What makes a dangling bond a binding site for thermal CH₃ radicals? — A combined molecular dynamics and potential energy analysis study on amorphous hydrocarbon films

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Maya, P. N.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Toussaint, U. von
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Maya, P. N., Toussaint, U. v., & Jacob, W. (2013). What makes a dangling bond a binding site for thermal CH₃ radicals? — A combined molecular dynamics and potential energy analysis study on amorphous hydrocarbon films. Diamond and Related Materials, 40, 41-50. doi:10.1016/j.diamond.2013.09.005.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0026-E1A7-4

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