Plasma chemical vapor deposition of hydrocarbon films: The influence of 
hydrocarbon source gas on the film properties

Schwarz-Selinger, T.; von Keudell, A.; Jacob, W.

doi:10.1063/1.371318

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Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties

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Schwarz-Selinger, T.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell, A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger, T., von Keudell, A., & Jacob, W. (1999). Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties. Journal of Applied Physics, 86(7), 3988-3996. doi:10.1063/1.371318.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-84E7-A

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